New Approaches to Image Processing based Failure Analysis of Nano Scale ULSI Devices

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  • Publisher : William Andrew
  • Release : 13 November 2013
  • ISBN : 9780128000175
  • Page : 110 pages
  • Rating : 4.5/5 from 103 voters

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New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can’t keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This book presents novel "smart" image processing methods, applications, and case studies concerning quality improvement of microscope images of microelectronic chips and process optimization. It explains an approach for high-resolution imaging of advanced metallization for micro- and nanoelectronics. This approach obviates the time-consuming preparation and selection of microscope measurement and sample conditions, enabling not only better electron-microscopic resolution, but also more efficient testing and quality control. This in turn leads to productivity gains in design and development of nano-scale ULSI chips. The authors also present several approaches for super-resolving low-resolution images to improve failure analysis of microelectronic chips. Acquaints users with new software-based approaches to enhance high-resolution microscope imaging of microchip structures Demonstrates how these methods lead to productivity gains in the development of ULSI chips Presents several techniques for the superresolution of images, enabling engineers and scientists to improve their results in failure analysis of microelectronic chips

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New Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices

New Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices
  • Author : Zeev Zalevsky,Pavel Livshits,Eran Gur
  • Publisher : William Andrew
  • Release Date : 2013-11-13
  • ISBN : 9780128000175
GET THIS BOOKNew Approaches to Image Processing based Failure Analysis of Nano-Scale ULSI Devices

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can’t keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices
  • Author : Zeev Zalevsky,Pavel Livshits,Eran Gur
  • Publisher : William Andrew Pub
  • Release Date : 2013-11-18
  • ISBN : 0323241433
GET THIS BOOKNew Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This book

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  • Publisher : William Andrew
  • Release Date : 2015-09-02
  • ISBN : 9780323312233
GET THIS BOOKHandbook of Silicon Based MEMS Materials and Technologies

The Handbook of Silicon Based MEMS Materials and Technologies, Second Edition, is a comprehensive guide to MEMS materials, technologies, and manufacturing that examines the state-of-the-art with a particular emphasis on silicon as the most important starting material used in MEMS. The book explains the fundamentals, properties (mechanical, electrostatic, optical, etc.), materials selection, preparation, manufacturing, processing, system integration, measurement, and materials characterization techniques, sensors, and multi-scale modeling methods of MEMS structures, silicon crystals, and wafers, also covering micromachining technologies in MEMS

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  • Publisher : Unknown
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  • ISBN : STANFORD:36105021108332
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  • Publisher : Springer Science & Business Media
  • Release Date : 2009-09-19
  • ISBN : 9780387958682
GET THIS BOOKAdvanced Nanoscale ULSI Interconnects: Fundamentals and Applications

In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern electronics systems. You can ?nd electronics systems today everywhere: from toys and home appliances to a- planes and space shuttles. Electronics systems form the hardware that together with software are the bases of the modern information society. The rapid growth and vast exploitation

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  • Publisher : Elsevier
  • Release Date : 2022-01-17
  • ISBN : 9780128241691
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Nanocellulose Materials: Fabrication and Industrial Applications focuses on the practices, distribution and applications of cellulose at the nanoscale. The book delivers recent advancements, highlights new perspectives and generic approaches on the rational use of nanocellulose, and includes sustainability advantages over conventional sources towards green and sustainable industrial developments. The topics and sub-topics are framed to cover all key features of cellulose, from extraction to technological evolution. Nanocellulose has great potential due to its versatility and numerous applications, including the potential

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Failure analysis is the preferred method to investigate product or process reliability and to ensure optimum performance of electrical components and systems. The physics-of-failure approach is the only internationally accepted solution for continuously improving the reliability of materials, devices and processes. The models have been developed from the physical and chemical phenomena that are responsible for degradation or failure of electronic components and materials and now replace popular distribution models for failure mechanisms such as Weibull or lognormal. Reliability engineers

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  • ISBN : 9789401595766
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GET THIS BOOKAn Introduction to Nanoscience and Nanotechnology

This book recalls the basics required for an understanding of the nanoworld (quantum physics, molecular biology, micro and nanoelectronics) and gives examples of applications in various fields: materials, energy, devices, data management and life sciences. It is clearly shown how the nanoworld is at the crossing point of knowledge and innovation. Written by an expert who spent a large part of his professional life in the field, the title also gives a general insight into the evolution of nanosciences and

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This book is a printed edition of the Special Issue "Integration of 2D Materials for Electronics Applications" that was published in Crystals

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