High Power Impulse Magnetron Sputtering

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  • Publisher : Unknown
  • Release : 13 September 2019
  • ISBN : 9780128124543
  • Page : 398 pages
  • Rating : 4.5/5 from 103 voters

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High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

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High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering
  • Author : Daniel Lundin,Jon Tomas Gudmundsson,Tiberiu Minea
  • Publisher : Unknown
  • Release Date : 2019-09-13
  • ISBN : 9780128124543
GET THIS BOOKHigh Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with

High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering
  • Author : Daniel Lundin,Tiberiu Minea,Jon Tomas Gudmundsson
  • Publisher : Elsevier
  • Release Date : 2019-08-28
  • ISBN : 9780128124550
GET THIS BOOKHigh Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with

Ionized Physical Vapor Deposition

Ionized Physical Vapor Deposition
  • Author : Anonim
  • Publisher : Academic Press
  • Release Date : 1999-10-14
  • ISBN : 9780080542935
GET THIS BOOKIonized Physical Vapor Deposition

This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and

Cathodic Arcs

Cathodic Arcs
  • Author : AndrĂ© Anders
  • Publisher : Springer Science & Business Media
  • Release Date : 2009-07-30
  • ISBN : 9780387791081
GET THIS BOOKCathodic Arcs

Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent

The Foundations of Vacuum Coating Technology

The Foundations of Vacuum Coating Technology
  • Author : Donald M. Mattox
  • Publisher : William Andrew
  • Release Date : 2018-08-21
  • ISBN : 9780128130858
GET THIS BOOKThe Foundations of Vacuum Coating Technology

The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our

Reactive Sputter Deposition

Reactive Sputter Deposition
  • Author : Diederik Depla,Stijn Mahieu
  • Publisher : Springer Science & Business Media
  • Release Date : 2008-06-24
  • ISBN : 9783540766643
GET THIS BOOKReactive Sputter Deposition

In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Discharge Physics of High Power Impulse Magnetron Sputtering

Discharge Physics of High Power Impulse Magnetron Sputtering
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2010
  • ISBN : OCLC:873637036
GET THIS BOOKDischarge Physics of High Power Impulse Magnetron Sputtering

High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is

Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing
  • Author : D. M. Mattox
  • Publisher : Cambridge University Press
  • Release Date : 2014-09-19
  • ISBN : 9780080946580
GET THIS BOOKHandbook of Physical Vapor Deposition (PVD) Processing

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed

Plasma Flares in High Power Impulse Magnetron Sputtering

Plasma Flares in High Power Impulse Magnetron Sputtering
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2012
  • ISBN : OCLC:951616434
GET THIS BOOKPlasma Flares in High Power Impulse Magnetron Sputtering

Characterization of High Power Impulse Magnetron Sputtering Discharges

Characterization of High Power Impulse Magnetron Sputtering Discharges
  • Author : Matej Hala
  • Publisher : Unknown
  • Release Date : 2013
  • ISBN : 0494909129
GET THIS BOOKCharacterization of High Power Impulse Magnetron Sputtering Discharges

Plasma Physics

Plasma Physics
  • Author : Alexander Piel
  • Publisher : Springer
  • Release Date : 2017-09-07
  • ISBN : 9783319634272
GET THIS BOOKPlasma Physics

The enlarged new edition of this textbook provides a comprehensive introduction to the basic processes in plasmas and demonstrates that the same fundamental concepts describe cold gas-discharge plasmas, space plasmas, and hot fusion plasmas. Starting from particle drifts in magnetic fields, the principles of magnetic confinement fusion are explained and compared with laser fusion. Collective processes are discussed in terms of plasma waves and instabilities. The concepts of plasma description by magnetohydrodynamics, kinetic theory, and particle simulation are stepwise introduced.

Plasma Diagnosis of Reactive High Power Impulse Magnetron Sputtering (HiPIMS) Discharges

Plasma Diagnosis of Reactive High Power Impulse Magnetron Sputtering (HiPIMS) Discharges
  • Author : Michael Bowes
  • Publisher : Unknown
  • Release Date : 2014
  • ISBN : OCLC:892863307
GET THIS BOOKPlasma Diagnosis of Reactive High Power Impulse Magnetron Sputtering (HiPIMS) Discharges

2020 29th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)

2020 29th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)
  • Author : IEEE Staff
  • Publisher : Unknown
  • Release Date : 2021-09-26
  • ISBN : 1728143152
GET THIS BOOK2020 29th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)

to encourage the advancement of the science and application of electrical insulation and discharges in vacuum

Magnetic Field Optimization for High Power Impulse Magnetron Sputtering

Magnetic Field Optimization for High Power Impulse Magnetron Sputtering
  • Author : Priya Raman
  • Publisher : Unknown
  • Release Date : 2016
  • ISBN : OCLC:988542557
GET THIS BOOKMagnetic Field Optimization for High Power Impulse Magnetron Sputtering

A Review Comparing Cathodic Arcs and High Power Impulse Magnetron Sputtering (HiPIMS).

A Review Comparing Cathodic Arcs and High Power Impulse Magnetron Sputtering (HiPIMS).
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2022-07-03
  • ISBN : OCLC:925470946
GET THIS BOOKA Review Comparing Cathodic Arcs and High Power Impulse Magnetron Sputtering (HiPIMS).

High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface